Cita APA (7a ed.)
Sonia, F., Gherardi, M., Chiappini, A., Adam, A., Isabelle, B., Alexey, F., . . . Bollani, M. (2025). Strain-Driven Dewetting and Interdiffusion in SiGe Thin Films on SOI for CMOS-Compatible Nanostructures. Nanomaterials. https://doi.org/10.3390/nano15130965
Cita Chicago Style (17a ed.)
Sonia, Freddi, Michele Gherardi, Andrea Chiappini, Arette-Hourquet Adam, Berbezier Isabelle, Fedorov Alexey, Daniel Chrastina, y Monica Bollani. "Strain-Driven Dewetting and Interdiffusion in SiGe Thin Films on SOI for CMOS-Compatible Nanostructures." Nanomaterials 2025. https://doi.org/10.3390/nano15130965.
Cita MLA (9a ed.)
Sonia, Freddi, et al. "Strain-Driven Dewetting and Interdiffusion in SiGe Thin Films on SOI for CMOS-Compatible Nanostructures." Nanomaterials, 2025, https://doi.org/10.3390/nano15130965.
Precaución: Estas citas no son 100% exactas.