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A New Yield Surface for Cemented Paste Backfill Based on the Modified Structured Cam-Clay

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Xuất bản năm:Minerals vol. 15, no. 1 (2025), p. 4
Tác giả chính: Safari, Amin
Tác giả khác: Taheri, Abbas, Karakus, Murat
Được phát hành:
MDPI AG
Những chủ đề:
Curing
Minerals
Soil testing
Investigations
Backfill
Production increases
Rockfill
Water
Mining
Hydration
Confining
Curing (processing)
Triaxial tests
Clay
Rheological properties
Cement
Confinement
Operating costs
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Bài tóm tắt:Cemented paste backfill (CPB) is a cemented void filling method gaining popularity over traditional hydraulic or rockfill methods. As mining depth increases, CPB-filled stopes are subjected to higher confining pressures. Due to the soil triaxial apparatus limitations, as the conventional method of triaxial testing on CPB, no confining pressures higher than 5 MPa can be applied to CPB over a range of curing time. This lack of data introduces uncertainty in predicting CPB behavior, potentially leading to an overestimation of the required strength. To address this, this study introduces a new testing method that allows for higher confinement beyond traditional limitations by modifying the Hoek triaxial cell to accommodate low-strength materials. This study then investigates the coupled influence of confining pressure and curing time (hydration) on CPB characteristics, specifically examining the impacts of different curing times and confining pressures on the mechanical and rheological properties of CPB. A total of 75 triaxial tests were conducted using 42 mm cylinder shape samples at five various curing times from 7 to 96 days, and applied at low and high confinement condition levels (0.5 to 30 MPa). The results reveal that hydration and confinement positively impact the CPB strength. The modified structured Cam-Clay model was selected to predict the behavior, and its yield surface was updated using the experimental results. The proposed yield model can be utilized to describe CPB material subjected to various curing and pressure conditions underground.
số ISSN:2075-163X
DOI:10.3390/min15010004
Nguồn:ABI/INFORM Global