Weak-Light-Enhanced AlGaN/GaN UV Phototransistors with a Buried p-GaN Structure

-д хадгалсан:
Номзүйн дэлгэрэнгүй
-д хэвлэсэн:Electronics vol. 14, no. 10 (2025), p. 2076
Үндсэн зохиолч: Wang, Haiping
Бусад зохиолчид: Zhang, Feiyu, Zhao Xuzhi, You Haifan, Ma, Zhan, Ye Jiandong, Lu, Hai, Zhang, Rong, Zheng Youdou, Chen Dunjun
Хэвлэсэн:
MDPI AG
Нөхцлүүд:
Онлайн хандалт:Citation/Abstract
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LEADER 00000nab a2200000uu 4500
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022 |a 2079-9292 
024 7 |a 10.3390/electronics14102076  |2 doi 
035 |a 3211940383 
045 2 |b d20250101  |b d20251231 
084 |a 231458  |2 nlm 
100 1 |a Wang, Haiping 
245 1 |a Weak-Light-Enhanced AlGaN/GaN UV Phototransistors with a Buried p-GaN Structure 
260 |b MDPI AG  |c 2025 
513 |a Journal Article 
520 3 |a We propose a novel ultraviolet (UV) phototransistor (PT) architecture based on an AlGaN/GaN high electron mobility transistor (HEMT) with a buried p-GaN layer. In the dark, the polarization-induced two-dimensional electron gas (2DEG) at the AlGaN/GaN heterojunction interface is depleted by the buried p-GaN and the conduction channel is closed. Under UV illumination, the depletion region shrinks to just beneath the AlGaN/GaN interface and the 2DEG recovers. The retraction distance of the depletion region during device turn-on operation is comparable to the thickness of the AlGaN barrier layer, which is an order of magnitude smaller than that in the conventional p-GaN/AlGaN/GaN PT, whose retraction distance spans the entire GaN channel layer. Consequently, the proposed device demonstrates significantly enhanced weak-light detection capability and improved switching speed. Silvaco Atlas simulations reveal that under a weak UV intensity of 100 nW/cm2, the proposed device achieves a photocurrent density of 1.68 × 10−3 mA/mm, responsivity of 8.41 × 105 A/W, photo-to-dark-current ratio of 2.0 × 108, UV-to-visible rejection ratio exceeding 108, detectivity above 1 × 1019 cm·Hz1/2/W, and response time of 0.41/0.41 ns. The electron concentration distributions, conduction band variations, and 2DEG recovery behaviors in both the conventional and novel structures under dark and weak UV illumination are investigated in depth via simulations. 
653 |a High electron mobility transistors 
653 |a Conduction bands 
653 |a Depletion 
653 |a Gallium nitrides 
653 |a Photoelectric effect 
653 |a Electric fields 
653 |a Aluminum gallium nitrides 
653 |a Barrier layers 
653 |a Buried structures 
653 |a Semiconductor devices 
653 |a Phototransistors 
653 |a Electron gas 
653 |a Light 
653 |a Performance evaluation 
653 |a Illumination 
653 |a Heterojunctions 
700 1 |a Zhang, Feiyu 
700 1 |a Zhao Xuzhi 
700 1 |a You Haifan 
700 1 |a Ma, Zhan 
700 1 |a Ye Jiandong 
700 1 |a Lu, Hai 
700 1 |a Zhang, Rong 
700 1 |a Zheng Youdou 
700 1 |a Chen Dunjun 
773 0 |t Electronics  |g vol. 14, no. 10 (2025), p. 2076 
786 0 |d ProQuest  |t Advanced Technologies & Aerospace Database 
856 4 1 |3 Citation/Abstract  |u https://www.proquest.com/docview/3211940383/abstract/embedded/7BTGNMKEMPT1V9Z2?source=fedsrch 
856 4 0 |3 Full Text + Graphics  |u https://www.proquest.com/docview/3211940383/fulltextwithgraphics/embedded/7BTGNMKEMPT1V9Z2?source=fedsrch 
856 4 0 |3 Full Text - PDF  |u https://www.proquest.com/docview/3211940383/fulltextPDF/embedded/7BTGNMKEMPT1V9Z2?source=fedsrch