Atomic layer deposition principles, characteristics, and nanotechnology applications /
I tiakina i:
| Kaituhi matua: | |
|---|---|
| Hōputu: | Tāhiko īPukapuka |
| Reo: | Ingarihi |
| I whakaputaina: |
Hoboken, NJ :
John Wiley & Sons,
c2013.
|
| Putanga: | 2nd ed. |
| Ngā marau: | |
| Urunga tuihono: | https://biblioteca.ues.edu.sv/acceso/elibro/?url=https%3A%2F%2Felibro.net%2Fereader%2Fbiblioues/179453 Ver en el OPAC |
| Ngā Tūtohu: |
Kāore He Tūtohu, Me noho koe te mea tuatahi ki te tūtohu i tēnei pūkete!
|
MARC
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| 003 | FINmELB | ||
| 005 | 20200520144314.0 | ||
| 006 | m o d | | ||
| 007 | cr cn||||||||| | ||
| 008 | 130422s2013 njua sb 001 0 eng d | ||
| 010 | |z 2013016209 | ||
| 020 | |z 9781118062777 (cloth : alk. paper) | ||
| 020 | |a 9781118747421 (electronic bk.) | ||
| 035 | |a (OCoLC)972871537 | ||
| 040 | |a FINmELB |c FINmELB |d FINmELB | ||
| 050 | 4 | |a TS695 |b .K33 2013 | |
| 082 | 0 | 4 | |a 620/.5 |2 23 |
| 100 | 1 | |a Kaariainen, Tommi. | |
| 245 | 1 | 0 | |a Atomic layer deposition |h [electronic resource] : |b principles, characteristics, and nanotechnology applications / |c Tommi Kaariainen ... [et al.]. |
| 250 | |a 2nd ed. | ||
| 260 | |a Hoboken, NJ : |b John Wiley & Sons, |c c2013. | ||
| 300 | |a xv, 253 p. : |b ill. | ||
| 504 | |a Includes bibliographical references and index. | ||
| 588 | |a Description based on metadata supplied by the publisher and other sources. | ||
| 590 | |a Electronic reproduction. Santa Fe, Arg.: elibro, 2022. Available via World Wide Web. Access may be limited to eLibro affiliated libraries. | ||
| 650 | 0 | |a Chemical vapor deposition. | |
| 650 | 0 | |a Epitaxy. | |
| 650 | 0 | |a Microelectronics. | |
| 650 | 0 | |a Nanotechnology. | |
| 655 | 4 | |a Electronic books. | |
| 797 | 2 | |a elibro, Corp. | |
| 856 | 4 | 0 | |u https://biblioteca.ues.edu.sv/acceso/elibro/?url=https%3A%2F%2Felibro.net%2Fereader%2Fbiblioues/179453 |
| 950 | |a eLibro English | ||