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A Coaxial Nozzle Attachment Improving the Homogeneity of the Gas Flow Sputtering

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Publicado en:Coatings vol. 14, no. 3 (2024), p. 279
Autor principal: Alktash, Nivin
Otros Autores: Körner, Stefan, Liu, Tianhao, Pflug, Andreas, Szyszka, Bernd, Muydinov, Ruslan
Publicado:
MDPI AG
Materias:
Germany
Stoichiometry
Attachment
Direct simulation Monte Carlo method
Organic chemicals
Simulation
High vacuum
Plasma
Poisoning
Gases
Ellipsometry
Glass substrates
Gas flow
Titanium
Process controls
Titanium dioxide
Film thickness
Homogeneity
Optical properties
Hollow cathodes
Coaxial nozzles
Cathode sputtering
Diffusers
Thin films
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Resumen:The Hollow Cathode Gas Flow Sputtering (GFS) provides special plasma conditions and is of extensive interest as a more affordable alternative to the high vacuum sputtering techniques. In the case of the tubular cathode a circular outlet symmetry stipulates homogeneity issues for both metallic and reactive deposition regimes. Using the results of Direct Simulation Monte Carlo (DSMC), we propose an external coaxial attachment which is manufactured and examined in a nozzle and a diffuser positioning. The impact on the homogeneity of Ti and&#xa0;<inline-formula>TiO2</inline-formula>&#xa0;films is examined using profilometry and spectral ellipsometry. Our results demonstrate that the use of the nozzle attachment significantly enhances film homogeneity from about 3&#xa0;<inline-formula>cm2</inline-formula>&#xa0;to more than 12&#xa0;<inline-formula>cm2</inline-formula>. It also secures better process control in terms of oxygen stoichiometry and film thickness. Some crucial general issues of the reactive GFS process are discussed.
ISSN:2079-6412
DOI:10.3390/coatings14030279
Fuente:Materials Science Database