Effects of Sn addition in W-doped Ag paste against electrochemical corrosion and sulfurization

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Publicado en:Anti - Corrosion Methods and Materials vol. 72, no. 1 (2025), p. 61-70
Autor principal: Shih, Huei-Jyun
Otros Autores: Lee, Ying-Chieh, Jing-Ru Pan, Chung, Claire
Publicado:
Emerald Group Publishing Limited
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Acceso en línea:Citation/Abstract
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Resumen:PurposeThis study aims to address these challenges by enhancing the resistance of Ag-based pastes to corrosion and sulfurization, thereby improving their performance and weatherability in high-power and high-frequency electronic applications.Design/methodology/approachThis study investigates the influence of Sn doping in W-doped Ag paste to enhance resistance against electrochemical corrosion and sulfurization. A systematic examination was conducted using transient liquid phase sintering and solid–liquid inter-diffusion techniques to understand the microstructural and electrochemical properties.FindingsThis study found that Sn addition in W-doped Ag paste significantly improves its resistance to electrochemical corrosion and sulfurization. The sintering process at 600°C led to the formation of an Ag2WO4 phase at the grain boundaries, which, along with the presence of Sn, effectively inhibited the growth of Ag2WO4 grains. The 0.5% Sn-doped samples exhibited optimal anti-corrosion properties, demonstrating a longer grain boundary length and a passivation effect that significantly reduced the corrosion rate. No Ag2S phase was detected in the weatherability tests, confirming the enhanced durability of the doped samples.Originality/valueThe findings of this study highlight the potential of Sn-doped Ag-W composites as a promising material for electronic components, particularly in environments prone to sulfurization and corrosion. By improving the anti-corrosion properties and reducing the grain size, this study offers a new approach to extending the lifespan and reliability of electronic devices, making a significant contribution to the development of advanced materials for high-power and high-frequency applications.
ISSN:0003-5599
1758-4221
DOI:10.1108/ACMM-08-2024-3064
Fuente:Science Database