Computational lithography
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| Autore principale: | |
|---|---|
| Altri autori: | |
| Natura: | Elettronico eBook |
| Lingua: | inglese |
| Pubblicazione: |
Oxford :
Wiley-Blackwell,
2010.
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| Serie: | Wiley series in pure and applied optics.
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| Soggetti: | |
| Accesso online: | https://biblioteca.ues.edu.sv/acceso/elibro/?url=https%3A%2F%2Felibro.net%2Fereader%2Fbiblioues/178332 Visualizza in OPAC |
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| 006 | m o d | | ||
| 007 | cr cn||||||||| | ||
| 008 | 091215s2010 enka sb 001 0 eng d | ||
| 020 | |z 9780470596975 | ||
| 020 | |z 047059697X | ||
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| 040 | |a FINmELB |c FINmELB |d FINmELB | ||
| 050 | 4 | |a TK7872.M3 |b M3 2010 | |
| 082 | 0 | 4 | |a 621.381531 |2 22 |
| 100 | 1 | |a Ma, Xu, |d 1983- | |
| 245 | 1 | 0 | |a Computational lithography |h [electronic resource] / |c Xu Ma and Gonzalo R. Arce. |
| 260 | |a Oxford : |b Wiley-Blackwell, |c 2010. | ||
| 300 | |a xv, 226 p. : |b ill. | ||
| 490 | 1 | |a Wiley series in pure and applied optics | |
| 504 | |a Includes bibliographical references and index. | ||
| 588 | |a Description based on metadata supplied by the publisher and other sources. | ||
| 590 | |a Electronic reproduction. Santa Fe, Arg.: elibro, 2021. Available via World Wide Web. Access may be limited to eLibro affiliated libraries. | ||
| 650 | 0 | |a Microlithography |x Mathematics. | |
| 650 | 0 | |a Integrated circuits |x Design and construction |x Mathematics. | |
| 650 | 0 | |a Photolithography |x Mathematics. | |
| 650 | 0 | |a Semiconductors |x Etching |x Mathematics. | |
| 650 | 0 | |a Resolution (Optics) | |
| 655 | 4 | |a Electronic books. | |
| 700 | 1 | |a Arce, Gonzalo R. | |
| 797 | 2 | |a elibro, Corp. | |
| 830 | 0 | |a Wiley series in pure and applied optics. | |
| 856 | 4 | 0 | |u https://biblioteca.ues.edu.sv/acceso/elibro/?url=https%3A%2F%2Felibro.net%2Fereader%2Fbiblioues/178332 |
| 950 | |a eLibro English | ||